Round Lab - Pine Calming Cica Mask
Round Lab - Pine Calming Cica Mask
Round Lab - Pine Calming Cica Mask
Round Lab - Pine Calming Cica Mask
Round Lab - Pine Calming Cica Mask
Round Lab - Pine Calming Cica Mask

Round Lab - Pine Calming Cica Mask

The Round Lab Pine Calming Cica Mask helps restore calm and relieve irritated skin with a unique combination of active ingredients, including pine tree extract, five types of cica-based ingredients, and hyaluronic acids of various sizes. The double wave mask sheet incorporates air holes to allow efficient absorption of the active ingredients, providing quick relief and improved moisture levels for troubled skin.

Size: 1 mask - 27ml

MADE IN KOREA.

Water, Pinus Densiflora Leaf Extract, Glycerin, Dipropylene Glycol, Glycereth-26, Centella Asiatica Extract, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate, Butylene Glycol, Portulaca Oleracea Extract, Propanediol, Chondrus Crispus, Ethylhexylglycerin, Biosaccharide Gum- 1. Glycoproteins, Ammonium Polyacryloyldimethyl Taurate, Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside, Asiatic Acid, Madecassoside, Madecassic Acid, Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid, Hydroxyethylcellulose, 1,2-Hexanediol, Hydroxyacetophenone, Disodium EDTA, Xanthan Gum, Carbomer

Ingredients subject to change at manufacturer's discretion. For the most complete and up-to-date list of ingredients, please refer to product packaging.

1. After cleansing, place the mask onto the skin and remove after 10 to 20 minutes.

2. Gently massage to absorb excess solution.

3. Recommended to apply remaining essence onto body area for better results.

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